OPTICAL PARAMETERS OF SILICON DIOXIDE THIN FILMS FORMED BY LOW-ENERGY IONS

Abstract

In this work, optical properties of silicon dioxide thin film were studied. Optical
parameters were measured using an IRTracer-100 spectrophotometer
(Shimadze). Thin films of silicon oxide were formed on a substrate heated in high
vacuum using a magnetron shaker, their absorption, transmission and reflection
spectra were obtained, absorption coefficient, refractive index, bonding and
vibrations of SiO2 atoms were measured.